Package structure and testing method

ABSTRACT

A package structure and a testing method are provided. The package structure includes a wiring structure, a first electronic device and a second electronic device. The wiring structure includes at least one dielectric layer, at least one conductive circuit layer in contact with the dielectric layer, and at least one test circuit structure in contact with the dielectric layer. The test circuit structure is disposed adjacent to the interconnection portion of the conductive circuit layer. The first electronic device is electrically connected to the wiring structure. The second electronic device is electrically connected to the wiring structure. The second electronic device is electrically connected to the first electronic device through the interconnection portion of the conductive circuit layer.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation of U.S. patent application Ser. No.16/812,232, filed Mar. 6, 2020 the contents of which is incorporatedherein by reference in its entirety.

BACKGROUND 1. Field of the Disclosure

The present disclosure relates to a package structure, and a testingmethod, and to a package structure including a wiring structure with atleast one test circuit structure, and a method for testing the same.

2. Description of the Related Art

Along with the rapid development in electronics industry and theprogress of semiconductor processing technologies, semiconductor packagestructures are integrated with an increasing number of electroniccomponents or electronic devices to achieve improved electricalperformance and additional functions. Accordingly, a warpage of thesemiconductor package structure may occur during the thermal process.Since a rigidity or stiffness of the semiconductor package structure isrelatively low, a crack may be formed at the top surface of thesemiconductor package structure or in a protection material and extendor grow into the interior of the semiconductor package structure. If thecrack reaches the semiconductor package structure, the conductivecircuit layer in the semiconductor package structure may be cracked orbroken, which may result in an open circuit and render the semiconductorpackage structure inoperative. Thus, a yield of the semiconductorpackage structure may decrease.

SUMMARY

In some embodiments, a package structure includes a wiring structure, afirst electronic device and a second electronic device. The wiringstructure includes at least one dielectric layer, at least oneconductive circuit layer in contact with the dielectric layer, and atleast one test circuit structure in contact with the dielectric layer.The test circuit structure is disposed adjacent to the interconnectionportion of the conductive circuit layer. The first electronic device iselectrically connected to the wiring structure. The second electronicdevice is electrically connected to the wiring structure. The secondelectronic device is electrically connected to the first electronicdevice through the interconnection portion of the conductive circuitlayer.

In some embodiments, a testing method includes: (a) providing a packagestructure, wherein the package structure includes a first electronicdevice, a second electronic device electrically connected to the firstelectronic device through at least one conductive circuit layer, and atleast one test circuit structure disposed adjacent to the at least oneconductive circuit layer; and (b) testing the at least one test circuitstructure.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of some embodiments of the present disclosure are readilyunderstood from the following detailed description when read with theaccompanying figures. It is noted that various structures may not bedrawn to scale, and dimensions of the various structures may bearbitrarily increased or reduced for clarity of discussion.

FIG. 1 illustrates a top view of a package structure according to someembodiments of the present disclosure.

FIG. 2 illustrates an enlarged view of a region “A” in FIG. 1 , whereina first electronic device, a second electronic device, a firstprotection material and a first dielectric layer are omitted for clearillustration.

FIG. 2A illustrates a top view of the interconnection portions and thetest circuit structures according to some embodiments of the presentdisclosure.

FIG. 3 illustrates a perspective view of FIG. 2 .

FIG. 4 illustrates a cross-sectional view taken along line 4-4 of thepackage structure of FIG. 1 .

FIG. 5 illustrates a cross-sectional view taken along line 5-5 of thepackage structure of FIG. 1 .

FIG. 6 illustrates a cross-sectional view taken along line 6-6 of thepackage structure of FIG. 1 .

FIG. 7 illustrates a cross-sectional view of a package structureaccording to some embodiments of the present disclosure.

FIG. 8 illustrates a cross-sectional view of a package structureaccording to some embodiments of the present disclosure.

FIG. 9 illustrates a cross-sectional view of a package structureaccording to some embodiments of the present disclosure.

FIG. 10 illustrates a cross-sectional view of a package structureaccording to some embodiments of the present disclosure.

FIG. 11 illustrates a perspective view of the test circuit structuresand the interconnection portions according to some embodiments of thepresent disclosure.

FIG. 12 illustrates a perspective view of the test circuit structure andthe interconnection portions according to some embodiments of thepresent disclosure.

FIG. 13 illustrates a cross-sectional view of an assembly structureaccording to some embodiments of the present disclosure.

FIG. 14 illustrates one or more stages of an example of a testing methodaccording to some embodiments of the present disclosure.

FIG. 15 illustrates one or more stages of an example of a testing methodaccording to some embodiments of the present disclosure.

FIG. 16 illustrates one or more stages of an example of a testing methodaccording to some embodiments of the present disclosure.

FIG. 17 illustrates one or more stages of an example of a testing methodaccording to some embodiments of the present disclosure.

FIG. 18 illustrates one or more stages of an example of a testing methodaccording to some embodiments of the present disclosure.

FIG. 19 illustrates one or more stages of an example of a testing methodaccording to some embodiments of the present disclosure.

FIG. 20 illustrates one or more stages of an example of a testing methodaccording to some embodiments of the present disclosure.

FIG. 21 illustrates one or more stages of an example of a testing methodaccording to some embodiments of the present disclosure.

DETAILED DESCRIPTION

Common reference numerals are used throughout the drawings and thedetailed description to indicate the same or similar components.Embodiments of the present disclosure will be readily understood fromthe following detailed description taken in conjunction with theaccompanying drawings.

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to explain certain aspects of the present disclosure. These are,of course, merely examples and are not intended to be limiting. Forexample, the formation of a first feature over or on a second feature inthe description that follows may include embodiments in which the firstand second features are formed or disposed in direct contact, and mayalso include embodiments in which additional features may be formed ordisposed between the first and second features, such that the first andsecond features may not be in direct contact. In addition, the presentdisclosure may repeat reference numerals and/or letters in the variousexamples. This repetition is for the purpose of simplicity and clarityand does not in itself dictate a relationship between the variousembodiments and/or configurations discussed.

At least some embodiments of the present disclosure provide for a wiringstructure which includes at least one test circuit structure. In someembodiments, a package structure includes such wiring structure suchthat a testing may be conducted to the test circuit structure, and theresult of such testing may simulate the condition of the conductivecircuit layer of the wiring structure. At least some embodiments of thepresent disclosure further provide for techniques for testing thepackage structure.

FIG. 1 illustrates a top view of a package structure 3 according to someembodiments of the present disclosure. FIG. 2 illustrates an enlargedview of a region “A” in FIG. 1 , wherein a first electronic device 24, asecond electronic device 26, a first protection material 32 and a firstdielectric layer 141 are omitted for clear illustration. FIG. 2Aillustrates a top view of the interconnection portions 15 a and the testcircuit structures 17 according to some embodiments of the presentdisclosure. FIG. 3 illustrates a perspective view of FIG. 2 . FIG. 4illustrates a cross-sectional view taken along line 4-4 of the packagestructure 3 of FIG. 1 . FIG. 5 illustrates a cross-sectional view takenalong line 5-5 of the package structure 3 of FIG. 1 . As shown in FIG. 4and FIG. 5 , the package structure 3 includes a wiring structure 1, afirst electronic device 24, a second electronic device 26, a firstprotection material 32, an encapsulant 34 and a plurality of soldermaterials 36. As shown in FIG. 1 , the package structure 3 may includeone first electronic device 24 and two second electronic devices 26.However, the amounts of the first electronic device(s) 24 and the secondelectronic device(s) 26 are not limited in the present disclosure.

As shown in FIG. 4 and FIG. 5 , the wiring structure 1 has a firstsurface 11 (e.g., a top surface), a second surface 12 (e.g., a bottomsurface) opposite to the first surface 11, a lateral surface 13extending between the first surface 11 and the second surface 12. Thewiring structure 1 may include at least one dielectric layer 14, atleast one conductive circuit layer 15 in contact with the dielectriclayer 14, at least one test circuit layer 17 in contact with thedielectric layer 14, and a plurality of protrusion pads 20. The wiringstructure 1 may further include a first chip bonding area 18, a secondchip bonding area 19 and a high line density region 16 (or a fine lineregion) disposed between the first chip bonding area 18 and the secondchip bonding area 19. The first electronic device 24 may be attached tothe first chip bonding area 18, and the second electronic devices 26 maybe attached to the second chip bonding area 19. Thus, the high linedensity region 16 (or the fine line region) may be disposed between thefirst electronic device 24 and the second electronic device 26.

For example, as shown in FIG. 4 and FIG. 5 , the wiring structure 1includes a first dielectric layer 141, a first conductive circuit layer151, a second dielectric layer 142, a second conductive circuit layer152, a third dielectric layer 143, a third conductive circuit layer 153,a fourth dielectric layer 144, a fourth conductive circuit layer 154,and a fifth dielectric layer 145. That is, the at least one dielectriclayer 14 includes the first dielectric layer 141, the second dielectriclayer 142, the third dielectric layer 143, the fourth dielectric layer144 and the fifth dielectric layer 145. The at least one conductivecircuit layer 15 includes the first conductive circuit layer 151, thesecond conductive circuit layer 152, the third conductive circuit layer153 and the fourth conductive circuit layer 154.

The first dielectric layer 141 may be a topmost dielectric layer or anoutermost dielectric layer of the wiring structure 1. The firstconductive circuit layer 151 may be a topmost conductive circuit layeror an outermost conductive circuit layer of the wiring structure 1. Amaterial of the first conductive circuit layer 151 may include, forexample, copper, another conductive metal, or an alloy thereof. Amaterial of the first dielectric layer 141 may include an insulatingmaterial, a passivation material, a dielectric material or a solderresist material, such as, for example, a benzocyclobutene (BCB) basedpolymer or a polyimide (PI). In some embodiments, the first dielectriclayer 141 may be made of a photoimageable material. In addition, thefirst surface 11 of the wiring structure 1 may be a top surface of thefirst dielectric layer 141. The first conductive circuit layer 151 isdisposed adjacent to the top surface of the first dielectric layer 141.In some embodiments, the first conductive circuit layer 151 is embeddedin the first dielectric layer 141, and is exposed from the top surfaceof the first dielectric layer 141. That is, the first dielectric layer141 covers the first conductive circuit layer 151, and defines aplurality of openings to expose portions of the first conductive circuitlayer 151.

Further, the first conductive circuit layer 151 may include aninterconnection portion 15 a and a periphery portion 15 b. The firstconductive circuit layer 151 may be a topmost conductive circuit layeror an outermost conductive circuit layer of the wiring structure 1. Theinterconnection portion 15 a is located in the high line density region16, and the periphery portion 15 b is located a region outside the highline density region 16 (e.g., a low line density region). For example,the second electronic device 26 may be electrically connected to thefirst electronic device 24 through the interconnection portion 15 a ofthe first conductive circuit layer 151. The second electronic device 26and the first electronic device 24 may be electrically connected to thesolder materials 36 on the second surface 12 of the wiring structure 1through the periphery portion 15 b of the first conductive circuit layer151. In some embodiments, the interconnection portion 15 a of the firstconductive circuit layer 151 may include a plurality of conductivetraces 15′ parallel with each other, and the periphery portion 15 b ofthe first conductive circuit layer 151 may include a plurality ofconductive traces 15″. A line width/line space (L/S) of the conductivetraces 15′ of the interconnection portion 15 a may be less than an L/Sof the conductive traces 15″ of the periphery portion 15 b. For example,an L/S of the conductive traces 15′ of the interconnection portion 15 amay be less than or equal to about 5 μm/about 5 μm, or less than orequal to about 2 μm/about 2 μm, or less than or equal to about 0.8μm/about 0.8 μm. An L/S of the conductive traces 15″ of the peripheryportion 15 b may be less than or equal to about 10 μm/about 10 μm, orless than or equal to about 7 μm/about 7 μm, or less than or equal toabout 5 μm/about 5 μm.

The first dielectric layer 141 and the first conductive circuit layer151 may be disposed on the second dielectric layer 142. In addition, thesecond dielectric layer 142 may cover the second conductive circuitlayer 152. A portion (i.e., a via portion 15 c) of the first conductivecircuit layer 151 extends through the second dielectric layer 142 toelectrically connect the second conductive circuit layer 152. A materialof the second dielectric layer 142 may be the same as or similar to thematerial of the first dielectric layer 141. The second conductivecircuit layer 152 may also include an interconnection portion 15 alocated in the high line density region 16, and a periphery portion 15 blocated outside the high line density region 16. In some embodiments,the via portion 15 c of the first conductive circuit layer 151 mayextend from the periphery portion 15 b, and they may be formedconcurrently and integrally.

Similarly, the second dielectric layer 142 and the second conductivecircuit layer 152 may be disposed on the third dielectric layer 143. Inaddition, the third dielectric layer 143 may cover the third conductivecircuit layer 153. A portion (i.e., a via portion 15 c) of the secondconductive circuit layer 152 extends through the third dielectric layer143 to electrically connect the third conductive circuit layer 153. Amaterial of the third dielectric layer 143 may be the same as or similarto the material of the second dielectric layer 142. The third conductivecircuit layer 153 may also include an interconnection portion 15 alocated in the high line density region 16, and a periphery portion 15 blocated outside the high line density region 16. In some embodiments,the via portion 15 c of the second conductive circuit layer 152 mayextend from the periphery portion 15 b, and they may be formedconcurrently and integrally.

Similarly, the third dielectric layer 143 and the third conductivecircuit layer 153 may be disposed on the fourth dielectric layer 144. Inaddition, the fourth dielectric layer 144 may cover the fourthconductive circuit layer 154. A portion (i.e., a via portion 15 c) ofthe third conductive circuit layer 153 extends through the fourthdielectric layer 144 to electrically connect the fourth conductivecircuit layer 154. A material of the fourth dielectric layer 144 may bethe same as or similar to the material of the third dielectric layer143. The fourth conductive circuit layer 154 may also include aninterconnection portion 15 a located in the high line density region 16,and a periphery portion 15 b located outside the high line densityregion 16.

The fourth dielectric layer 144 and the fourth conductive circuit layer154 may be disposed on the fifth dielectric layer 145. A portion (i.e.,a via portion 15 c) of the fourth conductive circuit layer 154 extendsthrough the fifth dielectric layer 145 to be exposed from a bottomsurface of the fifth dielectric layer 145 (e.g., the second surface 12of the wiring structure 1). A material of the fifth dielectric layer 145may be the same as or similar to the material of the fourth dielectriclayer 144. As shown in FIG. 4 and FIG. 5 , the second electronic device26 may be electrically connected to the first electronic device 24through the interconnection portion 15 a of the conductive circuit layer15 (including, for example, the interconnection portions 15 a of thefirst conductive circuit layer 151, the second conductive circuit layer152, the third conductive circuit layer 153 and the fourth conductivecircuit layer 154). The second electronic device 26 and the firstelectronic device 24 may be electrically connected to the soldermaterials 36 through the via portions 15 c of the periphery portion 15 bof the conductive circuit layer 15 (including, for example, theperiphery portions 15 b of the first conductive circuit layer 151, thesecond conductive circuit layer 152, the third conductive circuit layer153 and the fourth conductive circuit layer 154).

The protrusion pads 20 may be disposed on and protrude from the firstdielectric layer 141 (i.e., the topmost dielectric layer or theoutermost dielectric layer) of the wiring structure 1. The protrusionpads 20 may be disposed on and protrude from the first surface 11 of thewiring structure 1, and extend through the first dielectric layer 141(i.e., the topmost dielectric layer or the outermost dielectric layer)to electrically connect the first conductive circuit layer 151. Theprotrusion pads 20 may include a plurality of first protrusion pads 21corresponding to the first electronic device 24 and a plurality ofsecond protrusion pads 22 corresponding to the second electronic device26.

The first electronic device 24 and the second electronic device 26 aredisposed adjacent to the first surface 11 of the wiring structure 1 sideby side, and are electrically connected to the conductive circuit layer15 of the wiring structure 1. The first electronic device 24 may be asemiconductor device such as an application specific integrated circuit(ASIC) die. As shown in FIG. 4 and FIG. 5 , the first electronic device24 may have a first active surface 241, a first backside surface 242opposite to the first active surface 241, and a lateral surface 243extending between the first active surface 241 and the first backsidesurface 242. The first electronic device 24 may have a first active area264 on the first active surface 241. A plurality of electrical circuitsand a plurality of electrical components are disposed within the firstactive area 264. Further, the first electronic device 24 may include aplurality of first electrical contacts 244 disposed adjacent to thefirst active surface 241. The first electrical contacts 244 may beexposed or may protrude from the first active surface 241 for electricalconnection. The first electrical contacts 244 may be pads, bumps, studs,pillars or posts. In some embodiments, the first electrical contacts 244of the first electronic device 24 may be electrically connected andphysically connected to the first protrusion pads 21 through a pluralityof solder materials 245. In other words, the first electronic device 24may be electrically connected to the wiring structure 1 by flip-chipbonding. For example, the first electrical contacts 244 may includecopper, gold, platinum, and/or other suitable material.

The second electronic device 26 may be a semiconductor device such ashigh bandwidth memory (HBM) die. As shown in FIG. 4 and FIG. 5 , thesecond electronic device 26 may have a second active surface 261, asecond backside surface 262 opposite to the second active surface 261,and a lateral surface 263 extending between the second active surface261 and the second backside surface 262. The second electronic device 26may have a second active area 266 on the second active surface 261. Aplurality of electrical circuits and a plurality of electricalcomponents are disposed within the second active area 266. Further, thesecond electronic device 26 may include a plurality of second electricalcontacts 264 disposed adjacent to the second active surface 261. Thesecond electrical contacts 264 may be exposed or may protrude from thesecond active surface 261 for electrical connection. The secondelectrical contacts 264 may be pads, bumps, studs, pillars or posts. Insome embodiments, the second electrical contacts 264 of the secondelectronic device 26 may be electrically connected and physicallyconnected to the second protrusion pads 22 through a plurality of soldermaterials 265. In other words, the second electronic device 26 may beelectrically connected to the wiring structure 1 by flip-chip bonding.For example, the second electrical contact 264 may include copper, gold,platinum, and/or other suitable material.

As shown in FIG. 1 to FIG. 3 , the test circuit structure 17 may bedisposed adjacent to the interconnection portion 15 a of the conductivecircuit layer 15. In some embodiments, the wiring structure 1 mayinclude a plurality of interconnection portions 15 a, a plurality oftest circuit structures 17 and a plurality of shielding walls 155. Theinterconnection portions 15 a, the test circuit structures 17 and theshielding walls 155 may be disposed at a same layer and may be formedconcurrently. Thus, a material of the test circuit structure 17 and theshielding wall 155 may be same as the material of the interconnectionportion 15 a, and a thickness of the test circuit structure 17 and athickness of the shielding wall 155 may be same as a thickness of theinterconnection portion 15 a. The outermost dielectric layer (i.e., thefirst dielectric layer 141) may cover the outermost conductive circuitlayer (i.e., the first conductive circuit layer 151) and the testcircuit structure 17. In some embodiments, the first conductive circuitlayer 151, the test circuit structures 17 and the shielding walls 155may constitute a first metal layer (i.e., a topmost metal layer) of thewiring structure 1. Further, the wiring structure 1 may further includea second metal layer including the second conductive circuit layer 152,a third metal layer including the third conductive circuit layer 153 anda fourth metal layer including the fourth conductive circuit layer 154.In some embodiments, the first metal layer and the third metal layer maybe signal transmission layers, and the the third metal layer and thefourth metal layer may be power/ground layers.

In addition, the interconnection portions 15 a are disposed next to eachother. The test circuit structures 17 are disposed on two sides of theinterconnection portions 15 a. Some of the shielding walls 155 may bedisposed between the interconnection portions 15 a so as to prevent thecrosstalk between the interconnection portions 15 a. Some of theshielding walls 155 may be disposed between the interconnection portion15 a and the test circuit structures 17 so as to prevent the crosstalkbetween the interconnection portion 15 a and the test circuit structures17. It is noted that the shielding walls 155 may be or may be notelectrically connected to a grounding layer. The test circuit structures17 and the shielding walls 155 may be located in the high line densityregion 16. Thus, the interconnection portions 15 a, the test circuitstructures 17 and the shielding walls 155 are disposed under a gap 30between the lateral surface 243 of the first electronic device 24 andthe lateral surface 263 of the second electronic device 26. That is, twoends of the interconnection portion 15 a extend to the first chipbonding area 18 and the second chip bonding area 19 respectively. Afirst portion of the interconnection portion 15 a is disposed within avertical projection of the first active area 246 of the first electronicdevice 24, and a second portion of the interconnection portion 15 a isdisposed within a vertical projection of the second active area 266 ofthe second electronic device 26. Further, two ends of the test circuitstructures 17 extend to the first chip bonding area 18 and the secondchip bonding area 19 respectively. Two ends of the shielding wall 155extend to the first chip bonding area 18 and the second chip bondingarea 19 respectively. A first portion of the test circuit structure 17is disposed within a vertical projection of the first active area 246 ofthe first electronic device 24, and a second portion of the test circuitstructure 17 is disposed within a vertical projection of the secondactive area 266 of the second electronic device 26. That is, the firstportion of the test circuit structure 17 extends to a space under thefirst electronic device 24, and the second portion of the test circuitstructure 17 extends to a space under the second electronic device 26.

In some embodiments, the test circuit structures 17 may be dummy, andmay be not electrically connected to the interconnection portions 15 aof the conductive circuit layer 15. That is, the test circuit structures17 may be electrically isolated from the interconnection portions 15 aof the conductive circuit layer 15. Further, the test circuit structuresmay be electrically isolated from the first electronic device 24 and thesecond electronic device 26. For example, the interconnection portion 15a of the conductive circuit layer 15 may be used to transmitting signals(e.g., digital signals) between the first electronic device 24 and thesecond electronic device 26, whereas the test circuit structure 17 doesnot have the function of transmitting signals (e.g., digital signals).Thus, the test circuit structure 17 may be electrically isolated from adigital signal transmission path of the package structure 3.

As shown in FIG. 2 , a pattern (or a layout) of the test circuitstructure 17 may be similar to or same as a pattern (or a layout) of theinterconnection portion 15 a of the conductive circuit layer 15. Forexample, the test circuit structure 17 may include a plurality ofsegments 171 parallel with each other. A line width/line space (L/S) ofthe segments 171 of the test circuit structure 17 may substantiallyequal to the line width/line space (L/S) of the conductive traces 15′ ofthe interconnection portion 15 a. Further, the conductive traces 15′ ofthe interconnection portion 15 a and the shielding walls 155 may besubstantially parallel with the segments 171 of the test circuitstructure 17. In addition, a width of the shielding wall 155 may begreater than a width of a conductive trace 15′ of the interconnectionportion 15 a by, for example, two times, three times, four time, or fivetimes or greater.

In some embodiments, a gap between the interconnection portion 15 a ofthe conductive circuit layer 15 and the shielding wall 155 may besubstantially equal to a line space of the conductive traces 15′ of theinterconnection portion 15 a. A gap between the test circuit structure17 and the shielding wall 155 may be substantially equal to a line spaceof the conductive traces 15′ of the interconnection portion 15 a. If theshielding walls 155 are omitted, a gap between the test circuitstructure 17 and the interconnection portion 15 a may be substantiallyequal to a line space of the conductive traces 15′ of theinterconnection portion 15 a.

As shown in FIG. 2A, an inclination angle may be formed between theconductive traces 15′ of the interconnection portion 15 a and thesegments 171 of the test circuit structure 17. Such inclination anglemay be less than 90 degrees, 60 degrees, 45 degrees, 30 degrees, or 15degrees. Thus, the conductive traces 15′ of the interconnection portion15 a are not perpendicular to the segments 171 of the test circuitstructure 17.

As shown in FIG. 2 and FIG. 3 , the segments 171 of each of the testcircuit structures 17 are connected in series with each other. In someembodiments, each of the test circuit structures 17 may be in aserpentine shape. Further, the test circuit structures 17 may beelectrically connected with each other through a connection portion 175.The connection portion 175 may be located in the high line densityregion 16 or outside the high line density region 16. In addition, theconnection portion 175 and the test circuit structures 17 may bedisposed at the same layer or at different layers. In some embodiments,the connection portion 175 may be disposed right above or right underthe interconnection portion 15 a.

As shown in FIG. 3 and FIG. 5 , one end of the test circuit structure 17may be electrically connected to the second surface 12 of the wiringstructure 1. For example, an outermost segment 171 of one of the testcircuit structures 17 may have an electrical connection end 172 that iselectrically connected downward to the second surface 12 of the wiringstructure 1 through a downward electrical path 174. The downwardelectrical path 174 may include the via portion 15 c of the firstconductive circuit layer 151, the via portion 15 c of the secondconductive circuit layer 152, the via portion 15 c of the thirdconductive circuit layer 153 and the via portion 15 c of the fourthconductive circuit layer 154. It is noted that the exposed via portion15 c of the fourth conductive circuit layer 154 may be an electricalcontact for a probe 91 (FIG. 18 ) to contact. The test circuit structure17 is electrically connected to the electrical contact. For example, anoutermost segment 171 of another one of the test circuit structures 17may have an electrical connection end 173 that is electrically connecteddownward to the second surface 12 of the wiring structure 1 through adownward electrical path 176 (FIG. 6 ). The downward electrical path 176may include the via portions 15 c of the first conductive circuit layer151, the second conductive circuit layer 152, the third conductivecircuit layer 153 and the fourth conductive circuit layer 154. It isnoted that the exposed via portion 15 c of the fourth conductive circuitlayer 154 may be an electrical contact for a probe to contact. The testcircuit structure 17 is electrically connected to the electricalcontact. Thus, the test circuit structures 17 are not electricallyconnected upward to the first electronic device 24 and the secondelectronic device 26. There is no protrusion pad 20 on the test circuitstructures 17. The test circuit structure 17 may be free of upwardelectrical connection. In some embodiments, the downward electricalpaths 174, 176 are independent electrical paths in the wiring structure1.

As shown in FIG. 4 and FIG. 5 , the first protection material 32 (i.e.,an underfill) is disposed in the first space 25 between the firstelectronic device 24 and the wiring structure 1 and in the second space27 between the second electronic device 26 and the wiring structure 1 soas to cover and protect the joints formed by the first electricalcontacts 244, the first protrusion pads 21 and the solder materials 245,and the joints formed by the second electrical contacts 264, the secondprotrusion pads 22 and the solder materials 265. In addition, the firstprotection material 32 may further extend into a gap 30 between thelateral surface 243 of the first electronic device 24 and the lateralsurface 263 of the second electronic device 26.

The encapsulant 34 (i.e., a second protection material) covers at leasta portion of the first surface 11 of the wiring structure 1, at least aportion of the first electronic device 24, at least a portion of thesecond electronic device 26 and the first protection material 32. Amaterial of the encapsulant 34 may be a molding compound with or withoutfillers. The encapsulant 34 has a first surface 341 (e.g., a topsurface) and a lateral surface 343. In some embodiments, the firstsurface 341 of the encapsulant 34, the first backside surface 242 of thefirst electronic device 24, the second backside surface 262 of thesecond electronic device 26 and a top surface of the first protectionmaterial 32 in the gap 30 may be substantially coplanar with each other.However, in other embodiments, the top surface of the first protectionmaterial 32 in the gap 30 may be recessed from the first backsidesurface 242 of the first electronic device 24 and/or the second backsidesurface 262 of the second electronic device 26. Thus, a portion of theencapsulant 34 may extend into the gap 30 between the first electronicdevice 24 and the second electronic device 26. In addition, the lateralsurface 343 of the encapsulant 34 may be substantially coplanar with thelateral surface 13 of the wiring structure 1.

The solder materials 36 (e.g., solder balls) are disposed adjacent tothe second surface 12 of the wiring structure 1 for external connection.As shown in FIG. 4 and FIG. 5 , the solder materials 36 are disposed onthe exposed portions (i.e., the bottom portions of the via portions 15c) of the fourth conductive circuit layer 154. In some embodiments, thesolder materials 36 may include a test solder material 361. The testsolder material 361 is electrically connected to the downward electricalpath 174. Thus, the test solder material 361 is electrically connectedto the electrical connection end 172 of the outermost segment 171 of thetest circuit structure 17 through the via portion 15 c of the firstconductive circuit layer 151, the via portion 15 c of the secondconductive circuit layer 152, the via portion 15 c of the thirdconductive circuit layer 153 and the via portion 15 c of the fourthconductive circuit layer 154.

FIG. 6 illustrates a cross-sectional view taken along line 6-6 of thepackage structure 3 of FIG. 1 . An outermost segment 171 of one of thetest circuit structures 17 may have an electrical connection end 173that is electrically connected downward to the second surface 12 of thewiring structure 1 through a downward electrical path 176 (FIG. 3 ). Thedownward electrical path 176 may include the via portion 15 c of thefirst conductive circuit layer 151, the via portion of the secondconductive circuit layer 152, the via portion 15 c of the thirdconductive circuit layer 153 and the via portion 15 c of the fourthconductive circuit layer 154. In some embodiments, the solder materials36 may include a test solder material 362. The test solder material 362is electrically connected to the downward electrical path 176. Thus, thetest solder material 362 is electrically connected to the electricalconnection end 173 of the outermost segment 171 of the test circuitstructure 17 through the via portion 15 c of the first conductivecircuit layer 151, the via portion 15 c of the second conductive circuitlayer 152, the via portion of the third conductive circuit layer 153 andthe via portion 15 c of the fourth conductive circuit layer 154.

In the embodiment illustrated in FIG. 1 to FIG. 6 , the pattern (or alayout) of the test circuit structure 17 may be similar to or same asthe pattern (or a layout) of the interconnection portion 15 a of theconductive circuit layer 15. Thus, the test circuit structure(s) 17 maysimulate the condition of the interconnection portion(s) 15 a of theconductive circuit layer 15. That is, if the segment(s) 171 of the testcircuit structure(s) 17 is cracked or broken, and an open circuit occursin the test circuit structure(s) 17, the interconnection portion(s) 15 aof the conductive circuit layer 15 may be assumed to be cracked orbroken. In the package structure 3, if a crack is formed at the topsurface of the first protection material 32 in the gap 30 and extend orgrow downward to crack or break the interconnection portion(s) 15 a ofthe conductive circuit layer 15, suck crack may crack or break the testcircuit structure(s) 17 simultaneously. Therefore, in a testing stage, atest may be conducted to the test circuit structure(s) 17 from thesecond surface 12 (e.g., the bottom surface) of the wiring structure 1through the downward electrical paths 174, 176 to presume whether or notthe interconnection portion(s) 15 a of the conductive circuit layer iscracked or broken. Such a test loop is only disposed in the wiringstructure 1, and will not pass through the first electronic device 24and the second electronic device 26. Thus, the first electronic device24 and the second electronic device 26 need not to add any circuit totest the interconnection portion(s) 15 a of the conductive circuit layer15.

FIG. 7 illustrates a cross-sectional view of a package structure 3 aaccording to some embodiments of the present disclosure. The packagestructure 3 a of FIG. 7 is similar to the package structure 3 of FIG. 1to FIG. 6 , except for a structure of the test circuit structure(s) 17 aof the wiring structure 1 a. The electrical connection end 173 of theoutermost segment 171 of one of the test circuit structures 17 iselectrically connected to a power/ground path of the wiring structure 1a. Thus, the test solder material 362 of FIG. 6 may be omitted. In someembodiments, the electrical connection end 173 of the outermost segment171 of one of the test circuit structures 17 may be electricallyconnected to the conductive circuit layer 15. Thus, the test circuitstructures 17 may receive test signals from the conductive circuit layer15.

FIG. 8 illustrates a cross-sectional view of a package structure 3 baccording to some embodiments of the present disclosure. The packagestructure 3 b of FIG. 8 is similar to the package structure 3 of FIG. 1to FIG. 6 , except for a position of the test circuit structure(s) 17 ofthe wiring structure 1 b. The test circuit structure(s) 17 may bedisposed above the interconnection portion(s) 15 a of the conductivecircuit layer 15. As shown in FIG. 8 , the test circuit structure(s) 17may be disposed on the top surface of the first dielectric layer 141(e.g., the first surface 11 of the wiring structure 1 a) and right abovethe interconnection portion(s) 15 a of the first conductive circuitlayer 151. Thus, the outermost dielectric layer (i.e., the firstdielectric layer 141) may cover the outermost conductive circuit layer(i.e., the first conductive circuit layer 151), and the test circuitstructure(s) 17 may be disposed on the outermost dielectric layer (i.e.,the first dielectric layer 141). In some embodiments, from a top view, atotal area of the test circuit structure(s) 17 may be greater than atotal area of the interconnection portion(s) of the first conductivecircuit layer 151, thus, the downward electrical paths 174, 176 may notcontact the interconnection portion(s) 15 a of the first conductivecircuit layer 151. In some embodiments, the test circuit structure(s) 17may be disposed under the interconnection portion(s) of the conductivecircuit layer 15.

FIG. 9 illustrates a cross-sectional view of a package structure 3 caccording to some embodiments of the present disclosure. The packagestructure 3 c of FIG. 9 is similar to the package structure 3 of FIG. 1to FIG. 6 , except for a position of the test circuit structure(s) 17 ofthe wiring structure 1 c. The interconnection portions 15 a of the thirdconductive circuit layer 153, the test circuit structure(s) 17 and theshielding walls 155 may be disposed at a same layer and may be formedconcurrently. Thus, the test circuit structure(s) 17 may be disposedunder the first conductive circuit layer 151. There may be no testcircuit structure(s) 17 in the first metal layer of the wiring structure1 c. The first metal layer of the wiring structure 1 c may include onlythe first conductive circuit layer 151.

FIG. 10 illustrates a cross-sectional view of a package structure 3 daccording to some embodiments of the present disclosure. The packagestructure 3 d of FIG. 10 is similar to the package structure 3 of FIG. 1to FIG. 6 , except for an amount and a position of the test circuitstructures 17 of the wiring structure 1 d. Each of the metal layers ofthe wiring structure 1 d may include the test circuit structures 17.That is, the second metal layer may further include the test circuitstructures 17 disposed adjacent to the interconnection portions 15 a ofthe second conductive circuit layer 152, the third metal layer mayfurther include the test circuit structures 17 disposed adjacent to theinterconnection portions 15 a of the third conductive circuit layer 153,and the fourth metal layer may further include the test circuitstructures 17 disposed adjacent to the interconnection portions 15 a ofthe fourth conductive circuit layer 154. In some embodiments, the testcircuit structures 17 disposed at different metal layers areelectrically connected in series with each other.

FIG. 11 illustrates a perspective view of the test circuit structures 17and the interconnection portions 15 a according to some embodiments ofthe present disclosure. The test circuit structures 17 of FIG. 11 aresimilar to the test circuit structures 17 of FIG. 3 , except that thetest circuit structures 17 are not electrically connected to each other.That is, the connection portion 175 is omitted. In addition, each of thetest circuit structures 17 may include an electrical connection end 172that is electrically connected to the downward electrical path 174, andan electrical connection end 173 that is electrically connected to thedownward electrical path 176.

FIG. 12 illustrates a perspective view of the test circuit structure 17and the interconnection portions 15 a according to some embodiments ofthe present disclosure. The test circuit structure 17 of FIG. 12 issimilar to the test circuit structures 17 of FIG. 11 , except for theamount of the test circuit structure(s) 17. As shown in FIG. 12 , thereis only one test circuit structures 17 disposed on one side of theinterconnection portions 15 a.

FIG. 13 illustrates a cross-sectional view of an assembly structure 4according to some embodiments of the present disclosure. The assemblystructure 4 may be also a package structure, and may include a basesubstrate 40, a package structure 3, a third protection material 44, aheat sink 46 and a plurality of external connectors 49.

The base substrate 40 may include a glass reinforced epoxy material(such as FR4), bismaleimide triazine (BT), epoxy resin, silicon, printedcircuit board (PCB) material, glass, ceramic or photoimageabledielectric (PID) material. The base substrate 40 may have a firstsurface 401 and a second surface 402 opposite to the first surface 401.As shown in FIG. 13 , the base substrate 40 may include a firstpatterned circuit 41, a second patterned circuit 42, and a plurality ofconductive vias 43. The first patterned circuit 41 may be disposedadjacent to the first surface 401 of the base substrate 40, and thesecond patterned circuit 42 may be disposed adjacent to the secondsurface 402 of the base substrate 40. The conductive vias 43 may extendthrough the base substrate 40 and electrically connect the firstpatterned circuit 41 and the second patterned circuit 42.

The package structure 3 of FIG. 13 may be same as or similar to thepackage structure 3 of FIG. 1 to FIG. 6 . The package structure 3 may beelectrically connected to the first patterned circuit 41 of the basesubstrate 40 through the solder materials 36. The third protectionmaterial 44 (i.e., an underfill) is disposed in a space between thepackage structure 3 and the base substrate 40 so as to cover and protectthe solder materials 36 and the first patterned circuit 41.

The heat sink 46 may be a cap or hat structure, and may define a cavity461 for accommodating the package structure 3. A material of the heatsink 46 may include metal such as copper, aluminum, and/or othersuitable material. A portion of the heat sink 46 may be attached to thetop surface of the package structure 3 through a thermal material 48(e.g., thermal interface material (TIM)) so as to dissipate the heatgenerated by the first electronic device 24 and the second electronicdevice 26. Another portion (e.g., bottom portion) of the heat sink 46may be attached to the base substrate 40 through an adhesive material.In addition, the external connectors 49 (e.g., solder balls) are formedor disposed on the second patterned circuit 42 for external connection.It is noted that the package structure 3 may be replaced by the packagestructures 3 a, 3 b, 3 c, 3 d of FIGS. 7, 8, 9, 10 .

During a testing process, the test circuit structure(s) 17 may be testedfrom the second surface 402 of the base substrate 40.

FIG. 14 through FIG. 21 illustrate a testing method according to someembodiments of the present disclosure. In some embodiments, the methodmay be also used for manufacturing the package structure 3 shown in FIG.1 to FIG. 6 , and the assembly structure 4 of FIG. 13 .

Referring to FIG. 14 , a carrier 50 is provided. The carrier 50 may bein a wafer type or strip type. The carrier 50 may include a releaselayer 52 disposed thereon. Then, a wiring structure 1′ is formed ordisposed on the release layer 52 on the carrier 50. The wiring structure1′ of FIG. 14 may be similar to the wiring structure 1 of FIG. 5 , andmay have a first surface 11, a second surface 12 opposite to the firstsurface 11, a high line density region 16 (or a fine line region), afirst chip bonding area 18 and a second chip bonding area 19. The wiringstructure 1′ may include at least one dielectric layer 14, at least oneconductive circuit layer 15 in contact with the dielectric layer 14, atleast one test circuit layer 17 in contact with the dielectric layer 14,and a plurality of protrusion pads 20. For example, as shown in FIG. 14, the wiring structure 1′ includes a first dielectric layer 141, a firstconductive circuit layer 151, a second dielectric layer 142, a secondconductive circuit layer 152, a third dielectric layer 143, a thirdconductive circuit layer 153, a fourth dielectric layer 144, a fourthconductive circuit layer 154, and a fifth dielectric layer 145.

The first conductive circuit layer 151 may include an interconnectionportion 15 a and a periphery portion 15 b. The interconnection portion15 a is located in the high line density region 16, and the peripheryportion 15 b is located outside the high line density region 16 (e.g., alow density region). A line width/line space (L/S) of the conductivetraces 15′ of the interconnection portion 15 a may be less than an L/Sof the conductive traces 15″ of the periphery portion 15 b.

The test circuit structure 17 may be disposed adjacent to theinterconnection portion 15 a of the conductive circuit layer 15. In someembodiments, the wiring structure 1′ may include a plurality ofinterconnection portions 15 a, a plurality of test circuit structures 17and a plurality of shielding walls 155. The interconnection portions 15a, the test circuit structures 17 and the shielding walls 155 may bedisposed at a same layer and may be formed concurrently. The testcircuit structures 17 and the shielding walls 155 may be located in thehigh line density region 16.

In some embodiments, the test circuit structures 17 may be dummy, andmay be not electrically connected to the interconnection portions 15 aof the conductive circuit layer 15. That is, the test circuit structures17 may be electrically isolated from the interconnection portions 15 aof the conductive circuit layer 15. For example, the interconnectionportion 15 a of the conductive circuit layer 15 may be used totransmitting signals (e.g., digital signals), whereas the test circuitstructure 17 does not have the function of transmitting signals (e.g.,digital signals).

As shown in FIG. 2 , a pattern (or a layout) of the test circuitstructure 17 may be similar to or same as a pattern (or a layout) of theinterconnection portion 15 a of the conductive circuit layer 15. Forexample, the test circuit structure 17 may include a plurality ofsegments 171 parallel with each other. A line width/line space (L/S) ofthe segments 171 of the test circuit structure 17 may substantiallyequal to the line width/line space (L/S) of the conductive traces 15′ ofthe interconnection portion 15 a. Further, the conductive traces 15′ ofthe interconnection portion 15 a and the shielding walls 155 may besubstantially parallel with the segments 171 of the test circuitstructure 17. As shown in FIG. 2 and FIG. 3 , the segments 171 of eachof the test circuit structures 17 are connected in series with eachother. Further, the test circuit structures 17 may be electricallyconnected with each other through a connection portion 175. As shown inFIG. 3 and FIG. 5 , one end of the test circuit structure 17 may beelectrically connected to the second surface 12 of the wiring structure1′. There is no protrusion pad 20 on the test circuit structures 17. Thetest circuit structure 17 may be free of upward electrical connection.

The protrusion pads 20 may be disposed on and protrude from the firstdielectric layer 141 (i.e., the topmost dielectric layer or theoutermost dielectric layer) of the wiring structure 1′. The protrusionpads 20 may be disposed on and protrude from the first surface 11 of thewiring structure 1′, and extend through the first dielectric layer 141(i.e., the topmost dielectric layer or the outermost dielectric layer)to electrically connect the first conductive circuit layer 151. Theprotrusion pads 20 may include a plurality of first protrusion pads 21and a plurality of second protrusion pads 22.

Referring to FIG. 15 , a first electronic device 24 and a secondelectronic device 26 are electrically connected to the conductivecircuit layer 15 of the wiring structure 1′ by flip-chip bonding. Thus,the second electronic device 26 may be electrically connected to thefirst electronic device 24 through the interconnection portion 15 a ofthe conductive circuit layer 15. In some embodiments, the firstelectrical contacts 244 of the first electronic device 24 may beelectrically connected and physically connected to the first protrusionpads 21 through a plurality of solder materials 245. In someembodiments, the second electrical contacts 264 of the second electronicdevice 26 may be electrically connected and physically connected to thesecond protrusion pads 22 through a plurality of solder materials 265.

Referring to FIG. 16 , a first protection material 32 (i.e., anunderfill) is formed or disposed in a first space 25 between the firstelectronic device 24 and the wiring structure 1′ and a second space 27between the second electronic device 26 and the wiring structure 1′ soas to cover the wiring structure 1′, the first electronic device 24 andthe second electronic device 26, and protect the joints formed by thefirst electrical contacts 244, the first protrusion pads 21 and thesolder materials 245, and the joints formed by the second electricalcontacts 264, the second protrusion pads 22 and the solder materials265. In addition, the first protection material 32 may further extendinto a gap 30 between the lateral surface 243 of the first electronicdevice 24 and the lateral surface 263 of the second electronic device26.

Referring to FIG. 17 , an encapsulant 34 (i.e., a second protectionmaterial) is formed or disposed to cover at least a portion of the firstsurface 11 of the wiring structure 1′, at least a portion of the firstelectronic device 24, at least a portion of the second electronic device26 and the first protection material 32. The encapsulant 34 has a firstsurface 341 (e.g., a top surface).

Referring to FIG. 18 , the carrier 50 and the release layer 52 areremoved. Thus, the second surface 12 of the wiring structure 1′ isexposed, and portions (i.e., the bottom portions of the via portions 15c) of the fourth conductive circuit layer 154 are exposed from thesecond surface 12 of the wiring structure 1′.

Then, a test may be conducted to the test circuit structure(s) 17 fromthe second surface 12 (e.g., the bottom surface) of the wiring structure1′ through the downward electrical paths 174, 176. Such test may be anelectrical test such as an open/short test as described follows. A firstprobe 91 and a second probe a testing apparatus are conducted orprovided to contact the downward electrical path 174 and the downwardelectrical path 176 (FIG. 6 ), respectively. In some embodiments, atesting signal is applied to one of the electrical paths (e.g., thetesting signal may be applied to the downward electrical path 174through the first probe 91), and the other one of the electrical path isgrounding (e.g., the downward electrical path 176 may be electricallyconnected to a ground layer through the second probe). For example, thetesting signal may be a testing electrical current. Thus, the testingelectrical current may be applied to the downward electrical path 174through the first probe 91. Then, a voltage between the two electricalpaths 174, 176 is measured. The measured voltage may be used todetermine whether an open circuit is occurred between the downwardelectrical paths 174, 176. If an open circuit occurs in the test circuitstructure(s) 17, an open circuit may be presumed to occur in theinterconnection portion(s) 15 a of the conductive circuit layer 15. Thatis, the interconnection portion(s) 15 a of the conductive circuit layer15 may be assumed to be cracked or broken. Accordingly, the quality ofthe interconnection portion(s) 15 a of the conductive circuit layer 15may be judged as unqualified or abnormal.

In the present disclosure, since the pattern (or a layout) of the testcircuit structure(s) 17 is similar to or same as the pattern (or alayout) of the interconnection portion(s) 15 a of the conductive circuitlayer 15, the test circuit structure(s) 17 may simulate the condition ofthe interconnection portion(s) 15 a of the conductive circuit layer 15.That is, if the segment(s) 171 of the test circuit structure(s) 17 iscracked or broken, and an open circuit occurs in the test circuitstructure(s) 17, the conductive traces 15′ of the interconnectionportion(s) 15 a of the conductive circuit layer 15 may be assumed to becracked or broken.

It is noted that, as shown in FIG. 7 , if the electrical connection end173 of the outermost segment 171 of one of the test circuit structures17 is electrically connected to a power/ground path of the wiringstructure 1 a, the second probe may be omitted.

Referring to FIG. 19 , a plurality of solder materials 36 (e.g., solderballs) are formed or disposed to the second surface 12 of the wiringstructure 1′. As shown in FIG. 19 , the solder materials 36 are disposedon the exposed portions (i.e., the bottom portions of the via portionsof the fourth conductive circuit layer 154. In some embodiments, thesolder materials 36 may include two test solder materials 361, 362 (FIG.6 ). The test solder material 361 is electrically connected to thedownward electrical path 174, and the test solder material 362 iselectrically connected to the downward electrical path 176. In someembodiments, the above-mentioned test (electrical test) may be conductedon the test solder materials 361, 362 to test the test circuitstructure(s) 17. For example, the first probe 91 may contact the testsolder material 361, and the second probe may contact the soldermaterial 362.

Referring to FIG. 20 , the encapsulant 34 is thinned from its firstsurface 341. Thus, the first surface 341 of the encapsulant 34, thefirst backside surface 242 of the first electronic device 24, the secondbackside surface 262 of the second electronic device 26 and a topsurface of the first protection material 32 in the gap 30 may besubstantially coplanar with each other.

In some embodiments, a singulation process may be conducted to thewiring structure 1′ so as to obtain a plurality of package structures 3shown in FIG. 1 to FIG. 6 .

Referring to FIG. 21 , the package structure 3 may be electricallyconnected to a first patterned circuit 41 of a base substrate 40 throughthe solder materials 36. The base substrate 40 may have a first surface401 and a second surface 402 opposite to the first surface 401. The basesubstrate 40 may include a first patterned circuit 41, a secondpatterned circuit 42, and a plurality of conductive vias 43. The firstpatterned circuit 41 may be disposed adjacent to the first surface 401of the base substrate 40, and the second patterned circuit 42 may bedisposed adjacent to the second surface 402 of the base substrate 40.The conductive vias 43 may extend through the base substrate 40 andelectrically connect the first patterned circuit 41 and the secondpatterned circuit 42. Then, a third protection material 44 (i.e., anunderfill) is formed or disposed in a space between the packagestructure 3 and the base substrate 40 so as to cover and protect thesolder materials 36 and the first patterned circuit 41.

Then, a heat sink 46 may be attached to the first electronic device 24,the second electronic device 26 and the base substrate 40. In someembodiments, the heat sink 46 may be a cap or hat structure, and maydefine a cavity 461 for accommodating the package structure 3. A portionof the heat sink 46 may be attached to the top surface of the packagestructure 3 through a thermal material 48 (e.g., thermal interfacematerial (TIM)). Another portion (e.g., bottom portion) of the heat sink46 may be attached to the base substrate 40 through an adhesivematerial. Then, a plurality of external connectors 49 (e.g., solderballs) may be formed or disposed on the second conductive circuit layer42 for external connection.

In some embodiments, the above-mentioned test (electrical test) may beconducted on the external connectors 49 (on the second surface 402 ofthe base substrate 40) to test the test circuit structure(s) 17. Then, asingulation process may be conducted to the wiring structure 1′ so as toobtain a plurality of assembly structures 4 shown in FIG. 13 .

Spatial descriptions, such as “above,” “below,” “up,” “left,” “right,”“down,” “top,” “bottom,” “vertical,” “horizontal,” “side,” “higher,”“lower,” “upper,” “over,” “under,” and so forth, are indicated withrespect to the orientation shown in the figures unless otherwisespecified. It should be understood that the spatial descriptions usedherein are for purposes of illustration only, and that practicalimplementations of the structures described herein can be spatiallyarranged in any orientation or manner, provided that the merits ofembodiments of this disclosure are not deviated from by such anarrangement.

As used herein, the terms “approximately,” “substantially,”“substantial” and “about” are used to describe and account for smallvariations. When used in conjunction with an event or circumstance, theterms can refer to instances in which the event or circumstance occursprecisely as well as instances in which the event or circumstance occursto a close approximation. For example, when used in conjunction with anumerical value, the terms can refer to a range of variation less thanor equal to ±10% of that numerical value, such as less than or equal to±5%, less than or equal to ±4%, less than or equal to ±3%, less than orequal to ±2%, less than or equal to ±1%, less than or equal to ±0.5%,less than or equal to ±0.1%, or less than or equal to ±0.05%. Forexample, two numerical values can be deemed to be “substantially” thesame or equal if a difference between the values is less than or equalto ±10% of an average of the values, such as less than or equal to ±5%,less than or equal to ±4%, less than or equal to ±3%, less than or equalto ±2%, less than or equal to ±1%, less than or equal to ±0.5%, lessthan or equal to ±0.1%, or less than or equal to ±0.05%.

Two surfaces can be deemed to be coplanar or substantially coplanar if adisplacement between the two surfaces is no greater than 5 μm, nogreater than 2 μm, no greater than 1 μm, or no greater than 0.5 μm.

As used herein, the singular terms “a,” “an,” and “the” may includeplural referents unless the context clearly dictates otherwise.

As used herein, the terms “conductive,” “electrically conductive” and“electrical conductivity” refer to an ability to transport an electriccurrent. Electrically conductive materials typically indicate thosematerials that exhibit little or no opposition to the flow of anelectric current. One measure of electrical conductivity is Siemens permeter (S/m). Typically, an electrically conductive material is onehaving a conductivity greater than approximately 10⁴ S/m, such as atleast 10⁵ S/m or at least 10⁶ S/m. The electrical conductivity of amaterial can sometimes vary with temperature. Unless otherwisespecified, the electrical conductivity of a material is measured at roomtemperature.

Additionally, amounts, ratios, and other numerical values are sometimespresented herein in a range format. It is to be understood that suchrange format is used for convenience and brevity and should beunderstood flexibly to include numerical values explicitly specified aslimits of a range, but also to include all individual numerical valuesor sub-ranges encompassed within that range as if each numerical valueand sub-range is explicitly specified.

While the present disclosure has been described and illustrated withreference to specific embodiments thereof, these descriptions andillustrations are not limiting. It should be understood by those skilledin the art that various changes may be made and equivalents may besubstituted without departing from the true spirit and scope of thepresent disclosure as defined by the appended claims. The illustrationsmay not be necessarily drawn to scale. There may be distinctions betweenthe artistic renditions in the present disclosure and the actualapparatus due to manufacturing processes and tolerances. There may beother embodiments of the present disclosure which are not specificallyillustrated. The specification and drawings are to be regarded asillustrative rather than restrictive. Modifications may be made to adapta particular situation, material, composition of matter, method, orprocess to the objective, spirit and scope of the present disclosure.All such modifications are intended to be within the scope of the claimsappended hereto. While the methods disclosed herein have been describedwith reference to particular operations performed in a particular order,it will be understood that these operations may be combined,sub-divided, or re-ordered to form an equivalent method withoutdeparting from the teachings of the present disclosure. Accordingly,unless specifically indicated herein, the order and grouping of theoperations are not limitations of the present disclosure.

What is claimed is:
 1. A package structure, comprising: a wiringstructure including at least one conductive circuit layer and a testcircuit structure disposed adjacent to an interconnection portion of theat least one conductive circuit layer; a first electronic deviceelectrically connected to the wiring structure; and a second electronicdevice electrically connected to the wiring structure, wherein the testcircuit structure is not electrically connected to the interconnectionportion of the at least one conductive circuit layer.
 2. The packagestructure of claim 1, wherein the test circuit structure includes asegment extending along the interconnection portion.
 3. The packagestructure of claim 2, wherein the segment is non-perpendicular to aconductive trace of the interconnection portion from a top view.
 4. Thepackage structure of claim 3, wherein the segment is substantiallyparallel with the conductive trace of the interconnection portion fromthe top view.
 5. The package structure of claim 1, wherein the testcircuit structure includes a first segment disposed at a first side ofthe interconnection portion and a second segment disposed at a secondside of the interconnection portion opposite to the first side.
 6. Thepackage structure of claim 5, wherein the first segment is electricallyconnected to the second segment.
 7. The package structure of claim 1,wherein the interconnection portion and the test circuit structure aredisposed at a same layer of the wiring structure.
 8. The packagestructure of claim 5, further comprising a connection portion connectingthe first segment and the second segment, wherein the interconnectionportion is disposed at a first layer of the wiring structure, and theconnection portion is disposed at a second layer different from thefirst layer of the wiring structure.
 9. The package structure of claim1, wherein a line width of a segment of the test circuit structure issubstantially equal to a line width of a conductive trace of theinterconnection portion.
 10. The package structure of claim 1, whereinthe test circuit structure includes a plurality of segments, theinterconnection portion includes a plurality of conductive traces, and aline space of the plurality of segments is substantially equal to a linespace of the plurality of conductive traces.
 11. A package structure,comprising: a wiring structure including a conductive circuit layer,wherein the conductive circuit layer includes a test circuit structure;a first electronic device disposed over the wiring structure; and asecond electronic device disposed over the wiring structure, wherein thetest circuit structure is not electrically connected to the firstelectronic device and the second electronic device.
 12. The packagestructure of claim 11, wherein in a top view, the test circuit structureis overlapped with the first electronic device or the second electronicdevice.
 13. The package structure of claim 12, wherein in the top view,the test circuit structure is overlapped with a gap between the firstelectronic device and the second electronic device.
 14. The packagestructure of claim 13, further comprising an underfill overlapped withthe gap.
 15. The package structure of claim 11, wherein the wiringstructure further includes an interconnection portion electricallyconnecting the first electronic device and the second electronic device,wherein in a top view, the interconnection portion is outflanked by thetest circuit structure.
 16. A package structure, comprising: a wiringstructure having a first surface and a second surface opposite to thefirst surface, and including a conductive circuit layer and a testcircuit structure disposed adjacent to the conductive circuit layer,wherein the test circuit structure is closer to the first surface thanto the second surface, wherein the wiring structure further includes anexposed test via pad exposed from the second surface and electricallyconnected to the test circuit structure.
 17. The package structure ofclaim 16, further comprising an electronic device disposed over thefirst surface of the wiring structure.
 18. The package structure ofclaim 17, wherein in a top view, the test circuit structure extends froma region under a projection of the electronic device to outside of theprojection of the electronic device.
 19. The package structure of claim16, further comprising a re-flowable material attached to the wiringstructure.
 20. The package structure of claim 16, further comprising aprotection material disposed more adjacent to the test circuit structurethan to the exposed test via pad.